1. Lithography in which radiation-sensitive film is exposed to an electron beam.
2. The practice of scanning a beam of electrons in a patterned fashion across a surface covered with a film called the resist, exposing the resist, and of selectively removing either exposed or non-exposed regions of the resist called, "developing".
3. Lithography in which the radiation-sensitive film or resist is placed in the vacuum chamber of a scanning-beam electron microscope and exposed by an electron beam under digital computer control.

After exposure, the film is removed from the vacuum chamber for conventional development and other production processes.